Surface feature engineering through nanosphere lithography

Moiré Nanosphere Lithography.

We have developed moiré nanosphere lithography (M-NSL), which incorporates in-plane rotation between neighboring monolayers, to extend the patterning capability of conventional nanosphere lithography (NSL). NSL, which uses self-assembled layers of monodisperse micro/nanospheres as masks, is a low-cost, scalable nanofabrication technique and has been widely employed to fabricate various nanopart...

Nanosphere Lithography for Nitride Semiconductors

Tunable multiband metasurfaces by moiré nanosphere lithography.

Moiré nanosphere lithography (MNSL), which features the relative in-plane rotation between two layers of self-assembled monodisperse nanospheres as masks, provides a cost-effective approach for creating moiré patterns on generic substrates. In this work, we experimentally and numerically investigate a series of moiré metasurfaces by MNSL. Due to the variety of gradient plasmonic nanostructures ...

Fabrication of nanopillars by nanosphere lithography

A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere e...

Nanosphere Lithography: Synthesis and Application of Nanoparticles with Inherently Anisotropic Structures and Surface Chemistry

Early work with size-tunable periodic particle arrays (PPAs) fabricated by nanosphere lithography (NSL) demonstrated that the localized surface plasmon resonance (LSPR) could be tuned throughout the visible region of the spectrum. The LSPR is sensitive to changes in nanoparticle aspect ratio and local dielectric environment. This property has recently been exploited to develop a novel method of...